Tempress LPCVD System

The Tempress Low Pressure Chemical Vapor Deposition (LPCVD) system is a modular horizontal furnace designed to process substrates up to 150mm in diameter as part of the manufacturing technology of semiconductor, optical, MEMS and solar devices. It is a 4-stack system set up to deposit Silicon Nitride, Poly Silicon, Low Temperature Oxide (LTO), and Phosphorous Doped LTO. All tubes operate independently.