Tempress LPCVD Furnace System
The Tempress Low Pressure Chemical Vapor Deposition (LPCVD) system is a modular horizontal furnace designed to process substrates up to 150mm in diameter as part of the semiconductor, optical, MEMS, and solar device manufacturing. It is a 4-stack system set up to deposit Silicon Nitride, Poly Silicon, Low Temperature Oxide (LTO), Silicon Rich Oxide (SRO), and Phosphorous doped LTO, Phosphorous doped Poly Si. All tubes operate independently.
1) Process: Run Sheet
Maintenance: Quartz Tube Installation Sheet
3) Maintenance: Nitride Furnace Consumable Inventory