The Micro/Nano Fabrication Center at the University of Arizona
 

 

Oxidation Furnace

Thermal oxidation furnace is used in oxidizing silicon wafers less than 5" in diameter at high temperatures of around 1000C either dry or with steam using a bubbler. No metals are allowed inside the tube.

University of Arizona | College of Engineering | 1230 E. Speedway Blvd. | Tucson, AZ 85721-0104
Phone: 520-621-3380 | Fax: 520-621-8881 | contact us
  
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