The Micro/Nano Fabrication Center at the University of Arizona


Plasma Enhanced CVD

Our tabletop Plasma Enhanced Chemical Vapor Deposition (PECVD) is used for depositing Silicon Dioxide, Silicon Nitride, and amorphous Silicon on substrates as large as 8" in diameter.

University of Arizona | College of Engineering | 1230 E. Speedway Blvd. | Tucson, AZ 85721-0104
Phone: 520-621-3380 | Fax: 520-621-8881 | contact us
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