The Micro/Nano Fabrication Center at the University of Arizona


Harrick Plasma Cleaner

Located in our Class 100 cleanroom, this tool is used to clean substrates and surfaces using an air, oxygen, or Ar low intensity plasma, minimizing the need for expensive/toxic solvents while conditioning the surface for maximum wettability or subsequent thin film adhesion. The low intensity plasma is ideal for surface cleaning at near ambient temperatures. Substrates are placed on a tray inside a cylindrical chamber of around 3" in diameter and 7" long. A vacuum is applied to allow for the creation of the low intensity plasma.

University of Arizona | Arizona Research Labs | 1230 E. Speedway Blvd. | Tucson, AZ 85721-0104
Phone: 520-621-9849 | Fax:(520) 626-7877  | contact us
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