The Micro/Nano Fabrication Center at the University of Arizona
 

 

Semitool Spin Rinse Dryer (SRD)

Located in our Class 100 cleanroom's lithography area, our double-stacked Semitool SRD will rinse wafers to the required resistivity using ultra-pure water and dry wafers using hot UHP N2. The system is currently set up to handle both 100mm and 150mm wafers.

 

University of Arizona | Arizona Research Labs | 1230 E. Speedway Blvd. | Tucson, AZ 85721-0104
Phone: 520-621-9849 | Fax:(520) 626-7877  | contact us
 
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