The Micro/Nano Fabrication Center at the University of Arizona
 

 

Verteq Spin-Rinse-Dryer (SRD)

The Verteq Spin-Rinse-Dryer (SRD) handles 200 mm substrates. Wafers are cleaned using DI water and dried with Nitrogen in a static free environment.

University of Arizona | College of Engineering | 1230 E. Speedway Blvd. | Tucson, AZ 85721-0104
Phone: 520-621-3380 | Fax: 520-621-8881 | contact us
  
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