Electron Beam Physical Vapor Deposition (PVD)
Located in our Class 100 cleanroom, our BOC Edwards Auto 306 is an electron beam evaporation system used for deposition of ultra pure films of metals as well as fused silica. Fully reproducible parameters provide
consistent, repeatable deposition results. The most common metals deposited using this system at MFC are Au, Cu, Ti, Cr. System can deposit up to 4 different materials in series in the same run. This system is most suitable for thin films of a few nanometers to a few microns.