The Micro/Nano Fabrication Center at the University of Arizona
 

Micro/Nano Fabrication Center


The University of Arizona's Micro/Nano Fabrication Center (formerly the Microelectronics Lab) was founded in the late 1980’s under the direction of Dr. John O’Hanlon. We have approximately 15,000 square feet of which approximately 3,500 sq ft is class 100 clean room and 300 sq ft of class 10 space. In addition we have a specially built class 1 body box which was designed for particle analysis. We have a complete De-ionized Water system and an automated wastewater neutralization system.

Following is a brief description of our Class 100 clean room capabilities:

  • A fully functional Photolithography area:
    • 2 align/exposure tools, a Carl Suss MJB3 (2" & 3" substrates) and an ABM system (2", 4"& 6" substrates). Both systems are equipped with infrared backside alignment capability.
    • UV Blanket exposure system for lower resolution pattern transfers.
    • A solvent hood and an acid/base hood.
  • A Low Pressure Chemical Vapor Deposition tool capable of depositing Silicon Nitride, Poly Silicon, Low Temperature Oxides, Phosphorous Doped Poly Silicon and Oxides, and Silicon Rich Oxides.
  • A thermal oxidation capability that will handle up to 5" substrates.
  • We offer 4 Plasma Etching & Ashing systems: a small Harrick Plasma for low power cleaning, a Microwave system for higher power cleaning, a Reactive Ion Etch system, and a plasma etcher.
  • Our Metrology area consists of a 4 pt probe, a Gaertner Ellipsometer, a Filmetrics thickness measurement tool, a Nanospec. a Tencor Alpha Step, and a General Instruments AFM.
  • For Metal Deposition we have a BOC Edwards Auto 306 E-beam deposition tool with a 4 metal hearth capable of insitu metal stack deposition and a Thermal Evaporator system for metals like Aluminum and Copper.
  • We have 2 IPEC 372/472 CMPs, one for polishing metals and one for oxides. For post CMP cleaning we have an OnTrac cleaning system and 6 inch and 8 inch SRDs.

Our Class 10 area has its own acid bench and 6 inch SRDs and SVG Vertical Furnace. The Class 10 area is a separate room with a separate entrance. It is very suitable for proprietary research.

The Class 1 body box is a totally separate section. It is a great facility for particle or other small room research.

At present we still have some clean room space for future tools and research. Our Chase area is very large, currently three quarters full of research equipment for ongoing Graduate Student research:

  • The chase area contains all facilitation requirements, acid & solvent exhaust, easy access to power, nitrogen (house and UP), DI and city water, drain to the neutralization system, space for vacuum pumps, etc.
  • We have a K&S wafer dicing saw and a Dewyel Wire Bonder.
  • 2 wet benches (one exhausted) are available in the chase.

Our water room contains all of the de-ionization equipment and a 2,000gallon Halar lined storage tank. The water runs consistently at 18.2 mega ohms. The waste water neutralization system is automated constantly monitoring the pH of 3 separate tanks, injecting caustic or acid as needed. The water and waste system are currently running at only 25% of the capacity. Currently no research is being done with our water, this offers fantastic opportunities!

We have a 2,000 gallon liquid nitrogen tank that is used in providing both Liquid N2 and Nitrogen gas for the center.

 
University of Arizona | College of Engineering | 1230 E. Speedway Blvd. | Tucson, AZ 85721-0104
Phone: 520-626-1223 | Fax: 520-626-7877 | contact us
 
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